Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by  the experimental  design method

dc.contributor.author	Carpi, Enio
dc.contributor.author	Van Hove, Marleen
dc.contributor.author	Alay, Josep Lluis
dc.contributor.author	Van Rossum, Marc
dc.date.accessioned	2021-09-29T13:04:26Z
dc.date.available	2021-09-29T13:04:26Z
dc.date.embargo	9999-12-31
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/546
dc.source.beginpage	895
dc.source.endpage	901
dc.source.issue	3
dc.source.journal	J. Vac. Sci. Technol. B
dc.source.volume	13
dc.title	Optimization of reactive ion etching of Al0.48In0.52As in CH4/H2 by the experimental design method
dc.type	Journal article
dspace.entity.type	Publication
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