Publication:

Use of grazing emission XRF for silicon wafer surface contamination measurements

Date

1996
Proceedings Paper
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorClaes, M.
dc.contributor.authorVan Grieken, R. E.
dc.contributor.authorBailleul, A.
dc.contributor.authorKnotter, Martin
dc.contributor.authorDe Bokx, P. K.
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-09-29T14:22:22Z
dc.date.available2021-09-29T14:22:22Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1159
dc.source.beginpage57
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage60
dc.title

Use of grazing emission XRF for silicon wafer surface contamination measurements

dc.typeProceedings paper
dspace.entity.typePublication
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