Publication:

Growth and material characterization of hafnium titanates deposited by atomic layer deposition

Date

2009
Journal article
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dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorClima, Sergiu
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSwerts, Johan
dc.contributor.authorNyns, Laura
dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWouters, Dirk
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.date.accessioned2021-10-18T01:51:24Z
dc.date.available2021-10-18T01:51:24Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16043
dc.identifier.urlhttp://scitation.aip.org/journals/doc/JESOAN-ft/vol_156/iss_10/G145_1.html
dc.source.beginpageG145
dc.source.endpageG151
dc.source.issue10
dc.source.journalJournal of the Electrochemical Society
dc.source.volume156
dc.title

Growth and material characterization of hafnium titanates deposited by atomic layer deposition

dc.typeJournal article
dspace.entity.typePublication
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