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Plasma enhanced CVD growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth
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Plasma enhanced CVD growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Iacopi, Francesca
;
Vereecken, Philippe
;
Schaekers, Marc
;
Caymax, Matty
;
Moelans, Nele
;
Blanpain, Bart
;
Richard, Olivier
;
Detavernier, Christophe
;
Griffiths, Hefin
Journal
Nanotechnology
Abstract
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1950
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Acq. date: 2025-12-11
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Metrics
Views
1950
since deposited on 2021-10-16
3
last month
Acq. date: 2025-12-11
Citations