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Plasma enhanced CVD growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

Date

2007
Journal article
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dc.contributor.authorIacopi, Francesca
dc.contributor.authorVereecken, Philippe
dc.contributor.authorSchaekers, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorMoelans, Nele
dc.contributor.authorBlanpain, Bart
dc.contributor.authorRichard, Olivier
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorGriffiths, Hefin
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRichard, Olivier
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-16T16:49:35Z
dc.date.available2021-10-16T16:49:35Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12333
dc.source.beginpage505307
dc.source.issue50
dc.source.journalNanotechnology
dc.source.volume18
dc.title

Plasma enhanced CVD growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

dc.typeJournal article
dspace.entity.typePublication
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