Publication:
Charge trapping in SiO2/HfO2 dual layer gate stacks
Date
| dc.contributor.author | Cartier, E. | |
| dc.contributor.author | Kerber, A. | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.date.accessioned | 2021-10-15T12:49:52Z | |
| dc.date.available | 2021-10-15T12:49:52Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8660 | |
| dc.source.beginpage | 105 | |
| dc.source.conference | Extended Abstracts of the 9th Workshop on Formation, Characterization and Reliability of Ultrathin Oxides | |
| dc.source.conferencedate | 23/01/2004 | |
| dc.source.conferencelocation | Atagawa Heights Japan | |
| dc.source.endpage | 110 | |
| dc.title | Charge trapping in SiO2/HfO2 dual layer gate stacks | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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