Use of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration

dc.contributor.author	Beynet, Julien
dc.contributor.author	De Roest, David
dc.contributor.author	Rochat, N.
dc.contributor.author	Kellens, Kristof
dc.contributor.author	Verdonck, Patrick
dc.contributor.author	Sprey, Hessel
dc.contributor.imecauthor	De Roest, David
dc.contributor.imecauthor	Kellens, Kristof
dc.contributor.imecauthor	Verdonck, Patrick
dc.contributor.imecauthor	Sprey, Hessel
dc.contributor.orcidimec	Verdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned	2021-10-17T21:23:44Z
dc.date.available	2021-10-17T21:23:44Z
dc.date.embargo	9999-12-31
dc.date.issued	2009
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14997
dc.source.beginpage	275
dc.source.conference	International Semiconductor Technology Conference - ISTC/CSTIC
dc.source.conferencedate	19/03/2009
dc.source.conferencelocation	Shanghai China
dc.source.endpage	280
dc.title	Use of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration
dc.type	Proceedings paper
dspace.entity.type	Publication
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