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Atomic layer deposition of hafnium titanates dielectric layers

Date

2008
Proceedings Paper
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dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Xin Peng
dc.contributor.authorWouters, Dirk
dc.contributor.authorKittl, Jorge
dc.contributor.authorSwerts, Johan
dc.contributor.authorKnaepen, W.
dc.contributor.authorDetavernier, Christophe
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-17T09:57:21Z
dc.date.available2021-10-17T09:57:21Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14334
dc.source.conference8th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate29/06/2008
dc.source.conferencelocationBrugge Belgium
dc.title

Atomic layer deposition of hafnium titanates dielectric layers

dc.typeProceedings paper
dspace.entity.typePublication
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