Publication:
Substrate noise isolation experiments in a 0.18μm 1P6M triple-well CMOS process on a lightly doped substrate
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1855 since deposited on 2021-10-16
Acq. date: 2025-12-16
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Views
1855 since deposited on 2021-10-16
Acq. date: 2025-12-16
Citations