Publication:

Defect profiling in FEFET Si:HfO2 layers

Date

2020
Journal article
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dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorPutcha, Vamsi
dc.contributor.authorIzmailov, Roman
dc.contributor.authorAfanas'ev, Valeri V.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJung, Taehwan
dc.contributor.authorHigashi, Yusuke
dc.contributor.authorDegraeve, Robin
dc.contributor.authorTruijen, Brecht
dc.contributor.authorKaczer, Ben
dc.contributor.authorRonchi, Nicolo
dc.contributor.authorMcMitchell, Sean
dc.contributor.authorBanerjee, Kaustuv
dc.contributor.authorClima, Sergiu
dc.contributor.authorBreuil, Laurent
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorLinten, Dimitri
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorPutcha, Vamsi
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorJung, Taehwan
dc.contributor.imecauthorHigashi, Yusuke
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorTruijen, Brecht
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorRonchi, Nicolo
dc.contributor.imecauthorMcMitchell, Sean
dc.contributor.imecauthorBanerjee, Kaustuv
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecPutcha, Vamsi::0000-0003-1907-5486
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecTruijen, Brecht::0000-0002-2288-1414
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecRonchi, Nicolo::0000-0002-7961-4077
dc.contributor.orcidimecBanerjee, Kaustuv::0000-0001-8003-6211
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecVan Houdt, Jan::1234-1234-1234-1235
dc.date.accessioned2021-10-29T01:41:04Z
dc.date.available2021-10-29T01:41:04Z
dc.date.embargo9999-12-31
dc.date.issued2020
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35686
dc.identifier.urlhttps://doi.org/10.1063/5.0029072
dc.source.beginpage203504
dc.source.issue20
dc.source.journalApplied Physics Letters
dc.source.volume117
dc.title

Defect profiling in FEFET Si:HfO2 layers

dc.typeJournal article
dspace.entity.typePublication
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