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Impact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution deposition
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Impact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution deposition
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Elshocht, Sven
;
Hardy, An
;
Adelmann, Christoph
;
Caymax, Matty
;
Conard, Thierry
;
Franquet, Alexis
;
Richard, Olivier
;
Van Bael, Marlies
;
Mullens, J.
;
De Gendt, Stefan
Journal
Journal of the Electrochemical Society
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1758
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Views
1758
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-16
Citations