Publication:

Immersion lithography and double patterning in advanced microelectronics

Date

2010
Proceedings Paper
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dc.contributor.authorVandeweyer, Tom
dc.contributor.authorBekaert, Joost
dc.contributor.authorErcken, Monique
dc.contributor.authorGronheid, Roel
dc.contributor.authorMiller, Andy
dc.contributor.authorTruffert, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVersluijs, Janko
dc.contributor.authorWiaux, Vincent
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.accessioned2021-10-18T23:27:28Z
dc.date.available2021-10-18T23:27:28Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18230
dc.source.beginpage752102
dc.source.conferenceInternational Conference on Micro- and Nano Electronics 2009
dc.source.conferencedate5/10/2009
dc.source.conferencelocationMoscow Russia
dc.title

Immersion lithography and double patterning in advanced microelectronics

dc.typeProceedings paper
dspace.entity.typePublication
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