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Next generation of decision making software for nanopatterns metrology: application to semiconductor industry

Date

2016
Proceedings Paper
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dc.contributor.authorDervillé, A.
dc.contributor.authorLabrosse, A.
dc.contributor.authorZimmermann, Y.
dc.contributor.authorFoucher, Johann
dc.contributor.authorGronheid, Roel
dc.contributor.authorBoeckx, Carolien
dc.contributor.authorSingh, Arjun
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2021-10-23T10:33:16Z
dc.date.available2021-10-23T10:33:16Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26539
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507055&resultClick=1
dc.source.beginpage977836
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Next generation of decision making software for nanopatterns metrology: application to semiconductor industry

dc.typeProceedings paper
dspace.entity.typePublication
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