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Stress characteritzation of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

Date

2009
Meeting abstract
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dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorFernandez Lanas, Tatiana
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorDekkers, Harold
dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-17T21:19:49Z
dc.date.available2021-10-17T21:19:49Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14943
dc.source.beginpage2366
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

Stress characteritzation of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

dc.typeMeeting abstract
dspace.entity.typePublication
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