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Leakage optimatisation of ultra-shallow junctions formed by solid phase epitaxial regrowth (SPER)

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dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKittl, Jorge
dc.contributor.authorHenson, Kirklen
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorDuffy, Ray
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPagès, Xavier
dc.contributor.authorVan der Jeugd, Kees
dc.contributor.authorStolk, P.
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan der Jeugd, Kees
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T05:24:11Z
dc.date.available2021-10-15T05:24:11Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7806
dc.source.beginpage65
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
dc.source.endpage72
dc.title

Leakage optimatisation of ultra-shallow junctions formed by solid phase epitaxial regrowth (SPER)

dc.typeProceedings paper
dspace.entity.typePublication
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