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Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

Date

2018
Journal article
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dc.contributor.authorZotovich, Alexey
dc.contributor.authorRezvanov, Askar
dc.contributor.authorChanson, Romain
dc.contributor.authorZhang, L.
dc.contributor.authorHacker, N.
dc.contributor.authorKurchikov, K.
dc.contributor.authorKlimin, S.
dc.contributor.authorZyryanov, S. M.
dc.contributor.authorLopaev, Dimitri
dc.contributor.authorGornev, E.
dc.contributor.authorClemente, I.
dc.contributor.authorMiakonkikh, A.
dc.contributor.authorMaslakov, K.
dc.date.accessioned2021-10-26T10:55:33Z
dc.date.available2021-10-26T10:55:33Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32390
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/1361-6463/aad06d
dc.source.beginpage325202
dc.source.issue32
dc.source.journalJournal of Physics D: Applied Physics
dc.source.volume51
dc.title

Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach

dc.typeJournal article
dspace.entity.typePublication
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