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Articles
Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties
Publication:
Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties
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Date
2024
Journal article
https://doi.org/10.1109/TSM.2023.3339330
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ashby, Tom
;
Truffert, Vincent
;
Cerbu, Dorin
;
Ausschnitt, Kit
;
Charley, Anne-Laure
;
Verachtert, Wilfried
;
Wuyts, Roel
Journal
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
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606
since deposited on 2024-03-26
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Downloads
112
since deposited on 2024-03-26
12
last month
2
last week
Acq. date: 2025-12-15
Views
606
since deposited on 2024-03-26
2
last month
Acq. date: 2025-12-15
Citations