Publication:

Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties

Date

2024
Journal article
https://doi.org/10.1109/TSM.2023.3339330
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dc.contributor.authorAshby, Tom
dc.contributor.authorTruffert, Vincent
dc.contributor.authorCerbu, Dorin
dc.contributor.authorAusschnitt, Kit
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorVerachtert, Wilfried
dc.contributor.authorWuyts, Roel
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.imecauthorAusschnitt, Kit
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorVerachtert, Wilfried
dc.contributor.imecauthorWuyts, Roel
dc.contributor.imecauthorAshby, Tom
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecWuyts, Roel::0000-0003-4236-995X
dc.contributor.orcidimecAshby, Tom::0000-0002-9259-6475
dc.date.accessioned2024-09-30T11:53:23Z
dc.date.available2024-03-26T17:00:55Z
dc.date.available2024-09-30T11:53:23Z
dc.date.embargo2023-12-05
dc.date.issued2024
dc.description.wosFundingTextNo Statement Available
dc.identifier.doi10.1109/TSM.2023.3339330
dc.identifier.issn0894-6507
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43735
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage46
dc.source.endpage58
dc.source.issue1
dc.source.journalIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
dc.source.numberofpages13
dc.source.volume37
dc.title

Machine Learning on Multiplexed Optical Metrology Pattern Shift Response Targets to Predict Electrical Properties

dc.typeJournal article
dspace.entity.typePublication
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