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Strain analysis of Si1-xGex embedded source/drain transistors by nano-beam diffraction

Date

2009
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dc.contributor.authorFavia, Paola
dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVerheyen, Peter
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-17T22:11:20Z
dc.date.available2021-10-17T22:11:20Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15298
dc.source.conferenceMicroscopy of Semiconducting Materials Conference - MSM XVI
dc.source.conferencedate17/03/2009
dc.source.conferencelocationOxford UK
dc.title

Strain analysis of Si1-xGex embedded source/drain transistors by nano-beam diffraction

dc.typeMeeting abstract
dspace.entity.typePublication
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