Publication:

Layer-controlled epitaxy of 2D semiconductors: bridging nanoscale phenomena to wafer-scale uniformity

Date

2018
Journal article
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dc.contributor.authorChiappe, Daniele
dc.contributor.authorLudwig, Jonathan
dc.contributor.authorLeonhardt, Alessandra
dc.contributor.authorEl Kazzi, Salim
dc.contributor.authorNalin Mehta, Ankit
dc.contributor.authorNuytten, Thomas
dc.contributor.authorCelano, Umberto
dc.contributor.authorSutar, Surajit
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorCaymax, Matty
dc.contributor.authorParedis, Kristof
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLin, Dennis
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBarla, Kathy
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorRadu, Iuliana
dc.contributor.imecauthorLudwig, Jonathan
dc.contributor.imecauthorLeonhardt, Alessandra
dc.contributor.imecauthorNalin Mehta, Ankit
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorSutar, Surajit
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorParedis, Kristof
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecNalin Mehta, Ankit::0000-0002-2169-940X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecParedis, Kristof::0000-0002-5163-4164
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-25T17:14:07Z
dc.date.available2021-10-25T17:14:07Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.issn0957-4484
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30412
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/1361-6528/aad798/pdf
dc.source.beginpage425602
dc.source.issue42
dc.source.journalNanotechnology
dc.source.volume29
dc.title

Layer-controlled epitaxy of 2D semiconductors: bridging nanoscale phenomena to wafer-scale uniformity

dc.typeJournal article
dspace.entity.typePublication
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