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Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films

Date

2003
Proceedings Paper
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dc.contributor.authorZhao, Chao
dc.contributor.authorBrijs, Bert
dc.contributor.authorDortu, Fabian
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.authorBesling, W.
dc.contributor.authorMaes, Jan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T07:58:52Z
dc.date.available2021-10-15T07:58:52Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8438
dc.source.beginpage243
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Processes
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
dc.source.endpage250
dc.title

Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films

dc.typeProceedings paper
dspace.entity.typePublication
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