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The effect of He plasma treatment on properties of organosilicate glass low-k films
Publication:
The effect of He plasma treatment on properties of organosilicate glass low-k films
Date
2011
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Braginsky, O.V.
;
Kovalev, A.S.
;
Lopaev, D.V.
;
Malykhin, E.M.
;
Mankelevich, Y.A.
;
Proshina, O.V.
;
Rakhimova, T.V.
;
Rakhimov, A.T.
;
Voloshin, D.G.
;
Vasilieva, A.N.
;
Zyryanov, S.M.
;
Smirnov, Evgeny
;
Baklanov, Mikhaïl
Journal
Journal of Applied Physics
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1907
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations
Metrics
Views
1907
since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations