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The effect of He plasma treatment on properties of organosilicate glass low-k films

Date

2011
Journal article
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dc.contributor.authorBraginsky, O.V.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorMalykhin, E.M.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorProshina, O.V.
dc.contributor.authorRakhimova, T.V.
dc.contributor.authorRakhimov, A.T.
dc.contributor.authorVoloshin, D.G.
dc.contributor.authorVasilieva, A.N.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorSmirnov, Evgeny
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T12:39:45Z
dc.date.available2021-10-19T12:39:45Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18620
dc.source.beginpage43303
dc.source.issue4
dc.source.journalJournal of Applied Physics
dc.source.volume109
dc.title

The effect of He plasma treatment on properties of organosilicate glass low-k films

dc.typeJournal article
dspace.entity.typePublication
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