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Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrier
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1907 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-08
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Views
1907 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-08
Citations