Publication:

Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrier

Date

2011
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorDe Dobbelaere, C.
dc.contributor.authorCalzada, M.L.
dc.contributor.authorJimenez, R.
dc.contributor.authorRicote, J.
dc.contributor.authorBretos, I.
dc.contributor.authorMullens, J.
dc.contributor.authorHardy, An
dc.contributor.authorVan Bael, Marlies
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.date.accessioned2021-10-19T13:04:10Z
dc.date.available2021-10-19T13:04:10Z
dc.date.issued2011
dc.identifier.issn0002-7863
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18781
dc.source.beginpage12922
dc.source.endpage12925
dc.source.issue33
dc.source.journalJournal of the American Chemical Society
dc.source.volume133
dc.title

Aqueous solutions for low-temperature photoannealing of functional oxide films: reaching the 400 degrees C Si-technology integration barrier

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles