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In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition : Initial growth of HfO2 on Si and Ge substrates
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1886 since deposited on 2021-10-19
Acq. date: 2025-12-12
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1886 since deposited on 2021-10-19
Acq. date: 2025-12-12
Citations