Publication:

Demonstration of a submicron damascene Cu/low-k mechanical sensor to monitor stress in BEOL metallisation

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorWilson, Chris
dc.contributor.authorCroes, Kristof
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorHorsfall, Horsfall
dc.contributor.authorO'Neill, Anthony G.
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.accessioned2021-10-18T05:17:33Z
dc.date.available2021-10-18T05:17:33Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16543
dc.source.beginpage31
dc.source.conferenceIEEE International Conference on Microelectronic Test Structures - ICMTS
dc.source.conferencedate30/03/2009
dc.source.conferencelocationOxnard, CA USA
dc.source.endpage35
dc.title

Demonstration of a submicron damascene Cu/low-k mechanical sensor to monitor stress in BEOL metallisation

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
17263.pdf
Size:
749.53 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions