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Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures

Date

2009
Journal article
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dc.contributor.authorRakhimova, Tatyana
dc.contributor.authorBraginsky, OLEG
dc.contributor.authorKlopovskiy, Konstantin
dc.contributor.authorKovalev, Alexander
dc.contributor.authorLopaev, Dmitry
dc.contributor.authorProshina, Olga
dc.contributor.authorRakhimov, Alexander
dc.contributor.authorShamiryan, Denis
dc.contributor.authorVasilieva, Anna
dc.contributor.authorVoloshin, Dmitry
dc.date.accessioned2021-10-18T02:09:02Z
dc.date.available2021-10-18T02:09:02Z
dc.date.issued2009
dc.identifier.issn0093-3813
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16087
dc.source.beginpage1683
dc.source.endpage1696
dc.source.issue9
dc.source.journalIEEE Transactions on Plasma Science
dc.source.volume37
dc.title

Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures

dc.typeJournal article
dspace.entity.typePublication
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