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Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer
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Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer
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Date
2014
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nag, Manoj
;
Steudel, Soeren
;
Bhoolokam, Ajay
;
Vaisman Chasin, Adrian
;
Myny, Kris
;
Mass, Joris
;
Fritz, Thomas
;
Trube, Jutta
;
Gelinck, Gerwin
;
Groeseneken, Guido
;
Heremans, Paul
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1980
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Views
1980
since deposited on 2021-10-22
1
last month
1
last week
Acq. date: 2025-12-10
Citations