Publication:

Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer

Date

2014
Presentation
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dc.contributor.authorNag, Manoj
dc.contributor.authorSteudel, Soeren
dc.contributor.authorBhoolokam, Ajay
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorMyny, Kris
dc.contributor.authorMass, Joris
dc.contributor.authorFritz, Thomas
dc.contributor.authorTrube, Jutta
dc.contributor.authorGelinck, Gerwin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorHeremans, Paul
dc.contributor.imecauthorNag, Manoj
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorMyny, Kris
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecMyny, Kris::0000-0002-5230-495X
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.date.accessioned2021-10-22T04:09:38Z
dc.date.available2021-10-22T04:09:38Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24303
dc.source.conference10th International Thin-Film Transistor Conference - ITC
dc.source.conferencedate23/01/2014
dc.source.conferencelocationDelft The Netherlands
dc.title

Amorphous-IGZO thin-film-transistors with mf-PVD SiO2 as an etch-stop-layer

dc.typeOral presentation
dspace.entity.typePublication
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