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CMOS compatible 2D material integration for Sensor Applications on 200mm wafers

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-3523-327X
cris.virtual.orcid0000-0002-9237-7862
cris.virtualsource.departmentaf09d06d-8b75-4741-997d-a6feb1b0b52d
cris.virtualsource.department8b6212e3-bdd8-4bad-8be0-eb156fa3dce8
cris.virtualsource.orcidaf09d06d-8b75-4741-997d-a6feb1b0b52d
cris.virtualsource.orcid8b6212e3-bdd8-4bad-8be0-eb156fa3dce8
dc.contributor.authorYoo, Tae Jin
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.date.accessioned2026-06-03T09:51:06Z
dc.date.available2026-06-03T09:51:06Z
dc.date.createdwos2026-02-10
dc.date.issued2024
dc.description.abstractTwo-dimensional (2D) materials show promising potential due to their electrical, photonic, and mechanical properties. While these materials are heavily researched for shrinking the size of transistors, their application in sensors and actuators field is just beginning. Challenge lies in integrating stable and reliable devices made from 2D materials using standard silicon-based CMOS fabrication tools. Due to defectivity, adhesion problems, and sensitivity to process conditions like temperature, the options for fabrication are limited. In our study, we highlight the challenges of integrating 2D materials in conventional fabrication conditions and explore methods for handling materials like graphene and MoS2 in a 200mm CMOS facility, paving the way for their use in sensors and actuators.
dc.description.wosFundingTextThe authors are grateful to Sybren Santermans for electrical measurements and analyzing the electrical characteristic result, to Sabrina Locorotondo and Palaniappa Subramaniam for dry etch development of 2D materials, to imec 200mm fab engineering for technical assistance and support to process wafers. Results incorporated in this work have received funding from the European Union (2DNeuralvision, 101119489). Views and opinions expressed are, however, those of the author(s) only and do not necessarily reflect those of the European Union or the European Commission. Neither the European Union nor the granting authority can be held responsible for them.
dc.identifier.doi10.1109/eptc62800.2024.10909811
dc.identifier.isbn979-8-3315-2201-8
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/59528
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherIEEE
dc.source.beginpage678
dc.source.conference26th Electronics Packaging Technology Conference (EPTC)
dc.source.conferencedate2024-12-03
dc.source.endpage683
dc.source.journal2024 IEEE 26TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE, EPTC
dc.source.numberofpages6
dc.subject.keywordsGRAPHENE
dc.title

CMOS compatible 2D material integration for Sensor Applications on 200mm wafers

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2026-04-07
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-04-07
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