Publication:

Process implications on the stability and reliability of 300 mm FAB MoS2 field-effect transistors

Date

2024-FEB 2
Journal article
https://doi.org/10.1038/s41699-024-00445-0
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Author(s)

Illarionov, Yu. Yu.
;
Karl, A.
;
Smets, Quentin  
;
Kaczer, Ben  
;
Knobloch, T.
;
Panarella, Luca  
;
Schram, Tom  
;
Brems, Steven  
;
Cott, Daire  
;
Asselberghs, Inge  
;
Grasser, T.

Journal

NPJ 2D MATERIALS AND APPLICATIONS

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64 since deposited on 2024-02-13
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