Publication:

Process implications on the stability and reliability of 300 mm FAB MoS2 field-effect transistors

Date

2024-FEB 2

Journal article

https://doi.org/10.1038/s41699-024-00445-0

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Author(s)

Illarionov, Yu. Yu.

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Panarella, Luca

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Asselberghs, Inge

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Journal

NPJ 2D MATERIALS AND APPLICATIONS

Metrics

618 since deposited on 2024-02-13

5last month

Acq. date: 2025-12-24