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Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics
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Analysis of slow de-trapping phenomena after a positive gate bias on AlGaN/GaN MIS-HEMTs with in-situ Si3N4/Al2O3 bilayer gate dielectrics
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Tian-Li
;
Marcon, Denis
;
Ronchi, Nicolo
;
Bakeroot, Benoit
;
You, Shuzhen
;
Stoffels, Steve
;
Van Hove, Marleen
;
Bisi, Davide
;
Meneghini, Matteo
;
Groeseneken, Guido
;
Decoutere, Stefaan
Journal
Solid-State Electronics
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1915
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Acq. date: 2025-12-10
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Metrics
Views
1915
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-10
Citations