Publication:
Complex admittance analysis for La2Hf2O7/SiO2 high-kappa dielectric stacks
Date
| dc.contributor.author | Apostolopoulos, G. | |
| dc.contributor.author | Vellianitis, G. | |
| dc.contributor.author | dimoulas, A. | |
| dc.contributor.author | Hooker, Jacob | |
| dc.contributor.author | Conard, Thierry | |
| dc.contributor.imecauthor | Conard, Thierry | |
| dc.contributor.orcidimec | Conard, Thierry::0000-0002-4298-5851 | |
| dc.date.accessioned | 2021-10-15T12:39:00Z | |
| dc.date.available | 2021-10-15T12:39:00Z | |
| dc.date.issued | 2004-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8480 | |
| dc.source.beginpage | 260 | |
| dc.source.endpage | 262 | |
| dc.source.issue | 2 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 84 | |
| dc.title | Complex admittance analysis for La2Hf2O7/SiO2 high-kappa dielectric stacks | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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