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Characterisation of high-k containing nanolayers by reference-free X-ray fluorescence analysis with synchrotron radiation

Date

2009
Proceedings Paper
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dc.contributor.authorKolbe, M.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorKrumrey, M.
dc.contributor.authorReading, M.
dc.contributor.authorVan den berg, J.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-17T23:34:13Z
dc.date.available2021-10-17T23:34:13Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15619
dc.source.beginpage293
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage300
dc.title

Characterisation of high-k containing nanolayers by reference-free X-ray fluorescence analysis with synchrotron radiation

dc.typeProceedings paper
dspace.entity.typePublication
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