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Conference contributions
N5 technology node dual-damascene interconnects enabled using multi patterning
Publication:
N5 technology node dual-damascene interconnects enabled using multi patterning
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Date
2017
Proceedings Paper
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35822.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Briggs, Basoene
;
Wilson, Chris
;
Devriendt, Katia
;
van der Veen, Marleen
;
Decoster, Stefan
;
Paolillo, Sara
;
Versluijs, Janko
;
Kesters, Els
;
Sebaai, Farid
;
Jourdan, Nicolas
;
El-Mekki, Zaid
;
Heylen, Nancy
;
Verdonck, Patrick
;
Wan, Danny
;
Varela Pedreira, Olalla
;
Croes, Kristof
;
Dutta, Shibesh
;
Ryckaert, Julien
;
Mallik, Arindam
;
Lariviere, Stephane
;
Boemmels, Juergen
;
Tokei, Zsolt
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2013
since deposited on 2021-10-24
Acq. date: 2025-12-09
Citations
Metrics
Views
2013
since deposited on 2021-10-24
Acq. date: 2025-12-09
Citations