Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
N5 technology node dual-damascene interconnects enabled using multi patterning
Publication:
N5 technology node dual-damascene interconnects enabled using multi patterning
Date
2017
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
35822.pdf
586.62 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Briggs, Basoene
;
Wilson, Chris
;
Devriendt, Katia
;
van der Veen, Marleen
;
Decoster, Stefan
;
Paolillo, Sara
;
Versluijs, Janko
;
Kesters, Els
;
Sebaai, Farid
;
Jourdan, Nicolas
;
El-Mekki, Zaid
;
Heylen, Nancy
;
Verdonck, Patrick
;
Wan, Danny
;
Varela Pedreira, Olalla
;
Croes, Kristof
;
Dutta, Shibesh
;
Ryckaert, Julien
;
Mallik, Arindam
;
Lariviere, Stephane
;
Boemmels, Juergen
;
Tokei, Zsolt
Journal
Abstract
Description
Metrics
Views
2012
since deposited on 2021-10-24
451
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
2012
since deposited on 2021-10-24
451
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations