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Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode
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Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chen, Yangyin
;
Goux, Ludovic
;
Pantisano, Luigi
;
Swerts, Johan
;
Adelmann, Christoph
;
Mertens, Sofie
;
Afanasiev, Valeri
;
Wang, Xin Peng
;
Govoreanu, Bogdan
;
Degraeve, Robin
;
Kubicek, Stefan
;
Paraschiv, Vasile
;
Jossart, Nico
;
Altimime, Laith
;
Jurczak, Gosia
;
Kittl, Jorge
;
Groeseneken, Guido
;
Wouters, Dirk
Journal
Microelectronic Engineering
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1918
since deposited on 2021-10-21
Acq. date: 2025-12-16
Citations
Metrics
Views
1918
since deposited on 2021-10-21
Acq. date: 2025-12-16
Citations