Publication:

Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode

Date

2013
Journal article
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dc.contributor.authorChen, Yangyin
dc.contributor.authorGoux, Ludovic
dc.contributor.authorPantisano, Luigi
dc.contributor.authorSwerts, Johan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorMertens, Sofie
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorWang, Xin Peng
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorKubicek, Stefan
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorJossart, Nico
dc.contributor.authorAltimime, Laith
dc.contributor.authorJurczak, Gosia
dc.contributor.authorKittl, Jorge
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorWouters, Dirk
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorJossart, Nico
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.date.accessioned2021-10-21T06:56:24Z
dc.date.available2021-10-21T06:56:24Z
dc.date.issued2013
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22130
dc.source.beginpage92
dc.source.endpage96
dc.source.journalMicroelectronic Engineering
dc.source.volume112
dc.title

Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode

dc.typeJournal article
dspace.entity.typePublication
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