Publication:

(A)thermal migration of Ge during junction formation in a-Si layers grown on thin SiGe-buffer layers

Date

2004
Proceedings Paper
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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPawlak, Bartek
dc.contributor.authorJanssens, Tom
dc.contributor.authorBrijs, Bert
dc.contributor.authorDelhougne, Romain
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-15T17:25:20Z
dc.date.available2021-10-15T17:25:20Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9826
dc.source.beginpage273
dc.source.conferenceHigh-Mobility Group-IV Materials and Devices
dc.source.conferencedate12/04/2004
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage279
dc.title

(A)thermal migration of Ge during junction formation in a-Si layers grown on thin SiGe-buffer layers

dc.typeProceedings paper
dspace.entity.typePublication
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