Publication:

In-line Metrology for Vertical Edge Placement Control of Monolithic CFET using CD-SEM

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2656471
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dc.contributor.authorSun, Wei
dc.contributor.authorDoi, Ayumi
dc.contributor.authorIsawa, Miki
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLorusso, Gian
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.contributor.orcidimecLorusso, Gian::0000-0003-3498-5082
dc.contributor.orcidimecVega Gonzalez, Victor::0000-0002-4320-0585
dc.date.accessioned2024-03-25T13:36:32Z
dc.date.available2023-07-28T17:39:55Z
dc.date.available2024-03-25T13:36:32Z
dc.date.issued2023
dc.identifier.doi10.1117/12.2656471
dc.identifier.eisbn978-1-5106-6100-4
dc.identifier.isbn978-1-5106-6099-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42233
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedateFEB 27-MAR 02, 2023
dc.source.conferencelocationSan Jose
dc.source.journalN/A
dc.source.numberofpages6
dc.source.volume12496
dc.title

In-line Metrology for Vertical Edge Placement Control of Monolithic CFET using CD-SEM

dc.typeProceedings paper
dspace.entity.typePublication
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