Publication:
Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma
Date
| dc.contributor.author | Mannaert, Geert | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | Travaly, Youssef | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Mannaert, Geert | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-16T03:14:12Z | |
| dc.date.available | 2021-10-16T03:14:12Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10843 | |
| dc.source.beginpage | 182 | |
| dc.source.conference | Proceedings 6th International Conference on Microelectronics and Interfaces | |
| dc.source.conferencedate | 21/03/2005 | |
| dc.source.conferencelocation | Santa Clara, CA USA | |
| dc.source.endpage | 184 | |
| dc.title | Minimizing plasma damage and in situ sealing of ultra low-k dielectric films by using of oxygen free fluorcarbon plasma | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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