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X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the cobalt/SiO2 interface

Date

1999
Journal article
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dc.contributor.authorConard, Thierry
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorMaex, Karen
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-06T10:49:53Z
dc.date.available2021-10-06T10:49:53Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3313
dc.source.beginpage1244
dc.source.endpage1249
dc.source.issue4
dc.source.journalJ. Vacuum Science and Technology A
dc.source.volume17
dc.title

X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry study of the role of Ti and TiN caps on the cobalt/SiO2 interface

dc.typeJournal article
dspace.entity.typePublication
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