Publication:

Area-Selective Electroless Deposition of Cu for Hybrid Bonding

 
dc.contributor.authorInoue, Fumihiro
dc.contributor.authorIacovo, Serena
dc.contributor.authorEl-Mekki, Zaid
dc.contributor.authorKim, Soon-Wook
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBeyne, Eric
dc.contributor.imecauthorInoue, Fumihiro
dc.contributor.imecauthorIacovo, Serena
dc.contributor.imecauthorEl-Mekki, Zaid
dc.contributor.imecauthorKim, Soon-Wook
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecIacovo, Serena::0000-0002-0826-9165
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2022-04-25T09:50:17Z
dc.date.available2021-12-04T02:06:10Z
dc.date.available2022-04-01T15:14:25Z
dc.date.available2022-04-25T09:50:17Z
dc.date.issued2021
dc.identifier.doi10.1109/LED.2021.3124960
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38529
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage1826
dc.source.endpage1829
dc.source.issue12
dc.source.journalIEEE ELECTRON DEVICE LETTERS
dc.source.numberofpages4
dc.source.volume42
dc.subject.keywordsLAYER
dc.title

Area-Selective Electroless Deposition of Cu for Hybrid Bonding

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: