Publication:
Selectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern Design
| dc.contributor.author | Mandal, Akhilesh Kumar | |
| dc.contributor.author | van der Veen, Marleen | |
| dc.contributor.author | Rahnemaihaghighi, Negin | |
| dc.contributor.author | Robson, Max | |
| dc.contributor.author | Claessens, Niels | |
| dc.contributor.author | Meersschaut, Johan | |
| dc.contributor.author | Jourdan, Nicolas | |
| dc.contributor.author | Tokei, Zsolt | |
| dc.contributor.author | Delabie, Annelies | |
| dc.contributor.imecauthor | Mandal, Akhilesh Kumar | |
| dc.contributor.imecauthor | Claessens, Niels | |
| dc.contributor.imecauthor | Meersschaut, Johan | |
| dc.contributor.imecauthor | Jourdan, Nicolas | |
| dc.contributor.imecauthor | Tokei, Zsolt | |
| dc.contributor.imecauthor | Delabie, Annelies | |
| dc.contributor.imecauthor | van der Veen, Marleen | |
| dc.contributor.imecauthor | Rahnemaihaghighi, Negin | |
| dc.contributor.orcidimec | Mandal, Akhilesh Kumar::0000-0002-7974-252X | |
| dc.contributor.orcidimec | Claessens, Niels::0000-0002-8863-9532 | |
| dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
| dc.contributor.orcidimec | Jourdan, Nicolas::0009-0005-4798-1736 | |
| dc.contributor.orcidimec | Tokei, Zsolt::0000-0003-3545-3424 | |
| dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
| dc.contributor.orcidimec | van der Veen, Marleen::0000-0002-9402-8922 | |
| dc.date.accessioned | 2024-09-26T14:10:21Z | |
| dc.date.available | 2024-01-23T18:29:31Z | |
| dc.date.available | 2024-09-26T14:10:21Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1002/admt.202301820 | |
| dc.identifier.issn | 2365-709X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43444 | |
| dc.publisher | WILEY | |
| dc.source.beginpage | Art. 2301820 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 5 | |
| dc.source.journal | ADVANCED MATERIALS TECHNOLOGIES | |
| dc.source.numberofpages | 12 | |
| dc.source.volume | 9 | |
| dc.subject.keywords | ATOMIC LAYER DEPOSITION | |
| dc.subject.keywords | CHEMICAL-VAPOR-DEPOSITION | |
| dc.subject.keywords | THIN-FILM | |
| dc.subject.keywords | COPPER | |
| dc.subject.keywords | RU | |
| dc.subject.keywords | DIFFUSION | |
| dc.title | Selectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern Design | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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