Publication:

Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering

Date

2021
Journal article
https://doi.org/10.1016/j.jmrt.2021.08.043
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dc.contributor.authorLi, Qiang
dc.contributor.authorChen, Cheng
dc.contributor.authorWang, Mingge
dc.contributor.authorLv, Yaohui
dc.contributor.authorMao, Yulu
dc.contributor.authorXu, Manzhang
dc.contributor.authorWang, Yingnan
dc.contributor.authorWang, Xuewen
dc.contributor.authorZhang, Zhiyong
dc.contributor.authorWang, Shouguo
dc.contributor.authorZhao, Wu
dc.contributor.authorStiens, Johan
dc.contributor.imecauthorStiens, Johan
dc.date.accessioned2022-06-16T12:14:23Z
dc.date.available2022-01-02T02:06:29Z
dc.date.available2022-06-16T12:14:23Z
dc.date.issued2021
dc.identifier.doi10.1016/j.jmrt.2021.08.043
dc.identifier.issn2238-7854
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38705
dc.publisherELSEVIER
dc.source.beginpage460
dc.source.endpage467
dc.source.issuena
dc.source.journalJOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T
dc.source.numberofpages8
dc.source.volume15
dc.subject.keywordsAMORPHOUS-SILICON
dc.title

Study on photoelectricity properties of SiCN thin films prepared by magnetron sputtering

dc.typeJournal article
dspace.entity.typePublication
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