Publication:

Nickel silicide formation using excimer laser annealing

Date

2012
Proceedings Paper
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dc.contributor.authorTous, Loic
dc.contributor.authorLerat, Jean-Francois
dc.contributor.authorEmeraud, Thierry
dc.contributor.authorNegru, R.
dc.contributor.authorHuet, K.
dc.contributor.authorUruena De Castro, Angel
dc.contributor.authorAleman, Monica
dc.contributor.authorRussell, Richard
dc.contributor.authorJohn, Joachim
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorTous, Loic
dc.contributor.imecauthorAleman, Monica
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecTous, Loic::0000-0001-9928-7774
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-20T17:05:24Z
dc.date.available2021-10-20T17:05:24Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21628
dc.source.beginpage503
dc.source.conference2nd International Conference on Crystalline Silicon Photovoltaics - SiliconPV
dc.source.conferencedate3/05/2012
dc.source.conferencelocationLeuven Belgium
dc.source.endpage509
dc.title

Nickel silicide formation using excimer laser annealing

dc.typeProceedings paper
dspace.entity.typePublication
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