Publication:
HF-last wet clean in combination with a low temperature GeH4-assisted HCl in-situ clean prior to Si0.8Ge0.2-on-Si epitaxial growth
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1905 since deposited on 2021-10-22
Acq. date: 2026-02-28
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Statistics
Views
1905 since deposited on 2021-10-22
Acq. date: 2026-02-28
Citations