Publication:
HF-last wet clean in combination with a low temperature GeH4-assisted HCl in-situ clean prior to Si0.8Ge0.2-on-Si epitaxial growth
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1904 since deposited on 2021-10-22
1last month
1last week
Acq. date: 2026-01-25
Citations
Statistics
Views
1904 since deposited on 2021-10-22
1last month
1last week
Acq. date: 2026-01-25
Citations