Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Presentations
Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide
Publication:
Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide
Copy permalink
Date
2003
Presentation
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cimino, S.
;
Pantisano, Luigi
;
Pacagnella, A.
;
Groeseneken, Guido
Journal
Abstract
Description
Metrics
Views
1890
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-15
Citations
Metrics
Views
1890
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-15
Citations