Publication:
Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide
Date
| dc.contributor.author | Cimino, S. | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.contributor.author | Pacagnella, A. | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.date.accessioned | 2021-10-15T04:09:24Z | |
| dc.date.available | 2021-10-15T04:09:24Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7322 | |
| dc.source.conference | 34th IEEE Semiconductor Interface Specialists Conference - SISC | |
| dc.source.conferencedate | 4/12/2003 | |
| dc.source.conferencelocation | Washington DC USA | |
| dc.title | Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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