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Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis
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Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis
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Date
2015
Meeting abstract
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31889.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leroy, F
;
Tillocher, T
;
Zhang, Liping
;
Girard, A.
;
Cardinaud, C.
;
Lefaucheux, P.
;
de Marneffe, Jean-Francois
;
Dussart, R.
;
Maekawa, K
;
Yatsuda, K
;
Baklanov, Mikhaïl
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1988
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-11
Citations
Metrics
Views
1988
since deposited on 2021-10-22
1
last month
Acq. date: 2025-12-11
Citations